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dc.contributor.authorTsai, MSen_US
dc.contributor.authorTseng, TYen_US
dc.date.accessioned2014-12-08T15:48:51Z-
dc.date.available2014-12-08T15:48:51Z-
dc.date.issued1998-08-01en_US
dc.identifier.issn0013-4651en_US
dc.identifier.urihttp://hdl.handle.net/11536/32482-
dc.description.abstractRF magnetron sputtered (Ba, Sr)TiO3 (BST) thin films were deposited on Pt/SiO substrate with various O-2/(O-2 + Ar) mixing ratios (OMR) ranging from 0 to 60%. Two possible conduction mechanisms of the BST thin films, the Poole-Frenkel (PF) transport (bulk limited conduction) and the Schottky emission (SE) (electrode limited conduction) were studied. Experimental results indicated that the BST films prepared at low OMR (0-25%) exhibit the SE mechanism dominated below the transition electric field of 490 kV/cm and the PF transport mechanism dominated beyond 490 kV/cm; and while those prepared at high OMR (40-60%) display the SE mechanism dominated both below and beyond the transition electric field. The difference in dominant mechanism (bulk and electrode limited conduction) between films was ascribed to concentration variation of the oxygen vacancy in the films.en_US
dc.language.isoen_USen_US
dc.titleConduction mechanism and temperature-dependent current-voltage in (Ba, Sr)TiO3 thin filmsen_US
dc.typeArticleen_US
dc.identifier.journalJOURNAL OF THE ELECTROCHEMICAL SOCIETYen_US
dc.citation.volume145en_US
dc.citation.issue8en_US
dc.citation.spage2853en_US
dc.citation.epage2860en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000074991700037-
dc.citation.woscount17-
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