標題: Dielectric and electrical properties of SrTiO(3+/-y)-(SiO2)(x) thin films
作者: Chou, HY
Chen, TM
Tseng, TY
應用化學系
電子工程學系及電子研究所
Department of Applied Chemistry
Department of Electronics Engineering and Institute of Electronics
公開日期: 21-七月-2005
摘要: 110 nm thick SrTiO(3 +/- y)-(SiO2), thin films with x = 0-0.45 were prepared on Pt/Ti/SiO2/Si substrates using the chemical solution deposition method and then annealed at temperatures ranging from 600 degrees C to 900 degrees C for I min. The dielectric and electrical properties of the SrTiO(3 +/- y)-(SiO2)(x) were obviously affected by the annealing temperature and composition. The dielectric constant of the thin films increased with increasing annealing temperature and decreased with an increase in Si content while the leakage current density decreased with an increase in Si content. The 700 degrees C annealed SrTiO(3 +/- y)-(SiO2)(x) thin film with x = 0.25 has a suitable cm(-2). dielectric constant of 94.8 and a low leakage current of 1.27 x 10(-8) A The time-dependent dielectric breakdown curve of the 700 degrees C and 800 degrees C annealed SrTiO(3 +/- y)-(SiO2), films with x = 0.25 have an expected lifetime of over 10 years at electric fields higher than 0.6 MV cm(-1).
URI: http://dx.doi.org/10.1088/0022-3727/38/14/022
http://hdl.handle.net/11536/13480
ISSN: 0022-3727
DOI: 10.1088/0022-3727/38/14/022
期刊: JOURNAL OF PHYSICS D-APPLIED PHYSICS
Volume: 38
Issue: 14
起始頁: 2446
結束頁: 2451
顯示於類別:期刊論文


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