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dc.contributor.authorTsai, LCen_US
dc.contributor.authorHuang, CFen_US
dc.contributor.authorFan, JCen_US
dc.contributor.authorChang, YHen_US
dc.contributor.authorChen, YFen_US
dc.contributor.authorTsai, WCen_US
dc.contributor.authorChang, CYen_US
dc.date.accessioned2014-12-08T15:48:53Z-
dc.date.available2014-12-08T15:48:53Z-
dc.date.issued1998-07-15en_US
dc.identifier.issn0021-8979en_US
dc.identifier.urihttp://hdl.handle.net/11536/32504-
dc.description.abstractPersistent photoconductivity (PPC) has been observed in boron-doped Si1-xGex/Si quantum wells. The decay kinetics of the PPC effect can be well described by a stretched-exponential function, I-ppc(t) = I-ppc(0)exp[-(t/tau)(beta)](0 < beta < 1), which is usually observed in many disorder materials. Through the studies of the PPC effect under various conditions, such as different temperature, different photon energy of photoexcitation, and different Ge content, we identify that the alloy potential fluctuations induced by compositional disorder are the origin of the PPC effect in Si1-xGex/Si quantum wells. (C) 1998 American Institute of Physics. [S0021-8979(98)00914-1].en_US
dc.language.isoen_USen_US
dc.titlePersistent photoconductivity in SiGe/Si quantum wellsen_US
dc.typeArticleen_US
dc.identifier.journalJOURNAL OF APPLIED PHYSICSen_US
dc.citation.volume84en_US
dc.citation.issue2en_US
dc.citation.spage877en_US
dc.citation.epage880en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000075257800032-
dc.citation.woscount4-
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