標題: Magnetic force microscopy study of domain walls on a thin cobalt film
作者: Lin, HN
Chiou, YH
Chen, BM
Shieh, HPD
Chang, CR
電子物理學系
光電工程學系
Department of Electrophysics
Department of Photonics
公開日期: 1-五月-1998
摘要: Two types of 180 degrees domain walls on a 115 nm cobalt film are observed by magnetic force microscopy. The surface Neel wall on top of an asymmetric Bloch wall is found inhomogeneous. with the width estimated to be around 200 nm. The width of the rhomb-structured cross-tie wall, on the other hand, is approximately 400 nm. The coexistence of these two types of domain walls indicates that their wall energies are comparable at the film thickness. (C) 1998 American institute of Physics.
URI: http://hdl.handle.net/11536/32632
ISSN: 0021-8979
期刊: JOURNAL OF APPLIED PHYSICS
Volume: 83
Issue: 9
起始頁: 4997
結束頁: 4999
顯示於類別:期刊論文