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dc.contributor.authorLu, Ting-Chouen_US
dc.contributor.authorZan, Hsiao-Wenen_US
dc.contributor.authorKer, Ming-Douen_US
dc.contributor.authorHuang, Wei-Mingen_US
dc.contributor.authorLin, Kun-Chihen_US
dc.contributor.authorShih, Ching-Chiehen_US
dc.contributor.authorChiu, Chao-Chianen_US
dc.contributor.authorLiu, Chun-Tingen_US
dc.date.accessioned2014-12-08T15:49:14Z-
dc.date.available2014-12-08T15:49:14Z-
dc.date.issued2008en_US
dc.identifier.issn0097-966Xen_US
dc.identifier.urihttp://hdl.handle.net/11536/32719-
dc.description.abstractThe temperature coefficient (TC) of n-type diode-connected polycrystalline silicon thin-film transistors (poly-Si TFTs) is investigated. The relationship between TC and the activation energy is observed and explained. It is also found that TC is not sensitive to the deviation of the laser crystallization energy. On the contrary, channel width can effectively modulate TC. By using the diode-connected poly-Si TFTs with different channel widths, a new bandgap reference circuit for precise analog circuit design on glass substrate is proposed and realized. From the experimental results in a LTPS process, the output voltage reference exhibits a very low TC of 195 ppm/degrees C, between 25 degrees C and 125 degrees C.en_US
dc.language.isoen_USen_US
dc.titleTemperature coefficient of diode-connected LTPS poly-Si TFTs and its application on the bandgap reference circuiten_US
dc.typeProceedings Paperen_US
dc.identifier.journal2008 SID INTERNATIONAL SYMPOSIUM, DIGEST OF TECHNICAL PAPERS, VOL XXXIX, BOOKS I-IIIen_US
dc.citation.volume39en_US
dc.citation.spage1410en_US
dc.citation.epage1413en_US
dc.contributor.department電機學院zh_TW
dc.contributor.departmentCollege of Electrical and Computer Engineeringen_US
dc.identifier.wosnumberWOS:000258530100356-
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