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dc.contributor.authorWu, Siang-Jhihen_US
dc.contributor.authorCheng, Jung-Anen_US
dc.contributor.authorChen, Huang-Ming P.en_US
dc.contributor.authorShin, You-Ruen_US
dc.contributor.authorShieh, Han-Ping D.en_US
dc.contributor.authorLiu, Pei-Yuen_US
dc.contributor.authorLo, Yu-Chengen_US
dc.contributor.authorLi, Huai-Anen_US
dc.contributor.authorHsieh, Wen-Jenen_US
dc.contributor.authorChiu, Hao-Chiehen_US
dc.contributor.authorLi, Chi-Hsinen_US
dc.contributor.authorChou, Kevinen_US
dc.date.accessioned2014-12-08T15:49:15Z-
dc.date.available2014-12-08T15:49:15Z-
dc.date.issued2008en_US
dc.identifier.issn0097-966Xen_US
dc.identifier.urihttp://hdl.handle.net/11536/32731-
dc.description.abstractA novel ink jet printing process without additional photolithography process for large area color filter fabrication has been developed in this study. A 100x100 mm(2) model of 32" color filters was fabricated for evaluation. New developed RGB inks were able to achieve 73% NTSC standard with the thickness of R, G, and B films at 1.80, 1.90, and 1.80 pm, respectively. The overflow issue can be solved by surface pretreatments, and color inks formulation.en_US
dc.language.isoen_USen_US
dc.titleLarge area color filter fabrication by using ink-jet printing technologyen_US
dc.typeProceedings Paperen_US
dc.identifier.journal2008 SID INTERNATIONAL SYMPOSIUM, DIGEST OF TECHNICAL PAPERS, VOL XXXIX, BOOKS I-IIIen_US
dc.citation.volume39en_US
dc.citation.spage1435en_US
dc.citation.epage1438en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000258530100363-
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