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dc.contributor.authorCHIU, HTen_US
dc.contributor.authorCHANG, WPen_US
dc.date.accessioned2014-12-08T15:04:55Z-
dc.date.available2014-12-08T15:04:55Z-
dc.date.issued1992-05-01en_US
dc.identifier.issn0261-8028en_US
dc.identifier.urihttp://dx.doi.org/10.1007/BF00728611en_US
dc.identifier.urihttp://hdl.handle.net/11536/3448-
dc.language.isoen_USen_US
dc.titleEFFECT OF HYDROGEN ON DEPOSITION OF TANTALUM NITRIDE THIN-FILMS FROM ETHYLIMIDOTANTALUM COMPLEXen_US
dc.typeArticleen_US
dc.identifier.doi10.1007/BF00728611en_US
dc.identifier.journalJOURNAL OF MATERIALS SCIENCE LETTERSen_US
dc.citation.volume11en_US
dc.citation.issue9en_US
dc.citation.spage570en_US
dc.citation.epage572en_US
dc.contributor.department交大名義發表zh_TW
dc.contributor.department應用化學系zh_TW
dc.contributor.departmentNational Chiao Tung Universityen_US
dc.contributor.departmentDepartment of Applied Chemistryen_US
dc.identifier.wosnumberWOS:A1992HT18800013-
dc.citation.woscount16-
Appears in Collections:Articles


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