完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | CHIU, HT | en_US |
dc.contributor.author | CHANG, WP | en_US |
dc.date.accessioned | 2014-12-08T15:05:01Z | - |
dc.date.available | 2014-12-08T15:05:01Z | - |
dc.date.issued | 1992-01-15 | en_US |
dc.identifier.issn | 0261-8028 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1007/BF00724610 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/3553 | - |
dc.language.iso | en_US | en_US |
dc.title | DEPOSITION OF TANTALUM NITRIDE THIN-FILMS FROM ETHYLIMIDOTANTALUM COMPLEX | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1007/BF00724610 | en_US |
dc.identifier.journal | JOURNAL OF MATERIALS SCIENCE LETTERS | en_US |
dc.citation.volume | 11 | en_US |
dc.citation.issue | 2 | en_US |
dc.citation.spage | 96 | en_US |
dc.citation.epage | 98 | en_US |
dc.contributor.department | 交大名義發表 | zh_TW |
dc.contributor.department | 應用化學系 | zh_TW |
dc.contributor.department | National Chiao Tung University | en_US |
dc.contributor.department | Department of Applied Chemistry | en_US |
dc.identifier.wosnumber | WOS:A1992HB97600012 | - |
dc.citation.woscount | 45 | - |
顯示於類別: | 期刊論文 |