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dc.contributor.authorLEE, CLen_US
dc.contributor.authorLEI, TFen_US
dc.contributor.authorHO, JHen_US
dc.contributor.authorWANG, WTen_US
dc.date.accessioned2014-12-08T15:05:11Z-
dc.date.available2014-12-08T15:05:11Z-
dc.date.issued1991-08-01en_US
dc.identifier.issn0018-9456en_US
dc.identifier.urihttp://dx.doi.org/10.1109/19.85352en_US
dc.identifier.urihttp://hdl.handle.net/11536/3723-
dc.description.abstractA dynamic large signal C-V measurement circuit is presented to measure real time C-V characteristics of a MOS structure under current stressing conditions. The real time information on the generation and filling of traps and surface states can thus be obtained. With this circuit it has been shown that, for an Al-gate MOS structure, charges on traps and interface surface states recover immediately after the stressing is removed.en_US
dc.language.isoen_USen_US
dc.titleA REAL-TIME C-V MEASUREMENT CIRCUIT FOR MOS CAPACITORS UNDER CURRENT STRESSINGen_US
dc.typeArticleen_US
dc.identifier.doi10.1109/19.85352en_US
dc.identifier.journalIEEE TRANSACTIONS ON INSTRUMENTATION AND MEASUREMENTen_US
dc.citation.volume40en_US
dc.citation.issue4en_US
dc.citation.spage775en_US
dc.citation.epage777en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:A1991GB24600021-
dc.citation.woscount0-
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