標題: QUANTUM EFFECT IN THE ACCUMULATION LAYER ON FIELD-INDUCED PHOTOLUMINESCENCE OF DOUBLE-BARRIER RESONANT TUNNELING STRUCTURES
作者: WU, JS
CHANG, KH
LEE, CP
CHANG, CY
LIU, DG
LIOU, DC
電子工程學系及電子研究所
Department of Electronics Engineering and Institute of Electronics
公開日期: 1-Jul-1991
摘要: The photoluminescence (PL) of double-barrier resonant tunneling structures (DBRTSs) with undoped electrodes under bias has been studied. The strong band bending across the cathode causes the quantum size effect in the accumulation layer. The resonant tunneling of electrons from the first excited quantum level in the accumulation layer produces a kink in the current-voltage characteristic. It is found that the PL intensity from the quantum well (QW) as a function of bias sharply peaks at the voltage corresponding to the kink. This provides evidence of the interaction between the first excited quantum state in the accumulation layer and the resonant state in the QW.
URI: http://dx.doi.org/10.1063/1.105532
http://hdl.handle.net/11536/3738
ISSN: 0003-6951
DOI: 10.1063/1.105532
期刊: APPLIED PHYSICS LETTERS
Volume: 59
Issue: 1
起始頁: 87
結束頁: 89
Appears in Collections:Articles