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dc.contributor.authorLIU, DGen_US
dc.contributor.authorCHIN, TCen_US
dc.contributor.authorLEE, CPen_US
dc.contributor.authorHWANG, HLen_US
dc.date.accessioned2014-12-08T15:05:18Z-
dc.date.available2014-12-08T15:05:18Z-
dc.date.issued1991-03-01en_US
dc.identifier.issn0038-1101en_US
dc.identifier.urihttp://hdl.handle.net/11536/3844-
dc.description.abstractThree HEMT structures, the single heterostructure HEMT (SH-HEMT), the quantum well HEMT (QW-HEMT) and the delta-doped HEMT (delta-HEMT) were analyzed by solving the Schroedinger equation and Poisson equation self-consistently. The potential and the carrier distributions as well as the charge controlled by gate bias were calculated for different structural parameters. Parallel conduction in AlGaAs, which is severe for SH-HEMTs, is greatly reduced in QW-HEMT and delta-HEMT structures. The effect of layer parameters such as spacer layer thickness and quantum-well width on device performance has been studied. SH-HEMT and QW-HEMT have been fabricated for the confirmation of our analysis.en_US
dc.language.isoen_USen_US
dc.titleANALYSIS OF SEVERAL HIGH-ELECTRON-MOBILITY-TRANSISTOR STRUCTURES BY A SELF-CONSISTENT METHODen_US
dc.typeArticleen_US
dc.identifier.journalSOLID-STATE ELECTRONICSen_US
dc.citation.volume34en_US
dc.citation.issue3en_US
dc.citation.spage253en_US
dc.citation.epage258en_US
dc.contributor.department電控工程研究所zh_TW
dc.contributor.departmentInstitute of Electrical and Control Engineeringen_US
dc.identifier.wosnumberWOS:A1991EZ88000003-
dc.citation.woscount5-
顯示於類別:期刊論文