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dc.contributor.author黃建達en_US
dc.contributor.authorJian-Da Huangen_US
dc.contributor.author郭浩中en_US
dc.contributor.author盧廷昌en_US
dc.contributor.authorHao-Chung Kuoen_US
dc.contributor.authorTien-Chang Luen_US
dc.date.accessioned2014-12-12T01:17:10Z-
dc.date.available2014-12-12T01:17:10Z-
dc.date.issued2007en_US
dc.identifier.urihttp://140.113.39.130/cdrfb3/record/nctu/#GT009524542en_US
dc.identifier.urihttp://hdl.handle.net/11536/38919-
dc.description.abstract在本篇論文中,利用將零維度矽奈米微晶埋藏於自我組裝奈米孔洞氧化矽模版中,展示了新型態的人工製造類鐵電材料,我們將量測到的極化場歸因於奈米晶粒與二氧化矽模板間非對稱介面鍵結感應電子極矩所產生。我們也將此種材料替換金-氧-半場效電晶體的閘極介電層,展示了高度的潛力應用在矽基非揮發鐵電記憶體。zh_TW
dc.description.abstractIn this thesis, a new class of artificially engineered ferroelectric-like materials synthesized by embedding three-dimensional arrays of Si nanocrystals in mesoporous silica matrix was reported. We attribute the measured polarization switching to polar layers lying at the interfaces between one-side bonded Si nanocrystals and mesoporous silica matrix. A metal-oxide-semiconductor field-effect transistor with the ferroelectric-like material in place of the gate dielectrics was fabricated to demonstrate its high potential for the silicon-based nonvolatile random-access memories.en_US
dc.language.isoen_USen_US
dc.subject非揮發記憶體zh_TW
dc.subject氧化矽複合材料zh_TW
dc.subject矽量子點zh_TW
dc.subjectNonvolatile memoryen_US
dc.subjectmesoporos silicaen_US
dc.subjectsilicon quantum-doten_US
dc.title含自組裝矽量子點之奈米孔洞氧化矽複合材料閘極之非揮發記憶體zh_TW
dc.titleNonvolatile memory with gate of self-assembled nanostructures of silicon quantum-dots in mesoporos silicaen_US
dc.typeThesisen_US
dc.contributor.department光電工程學系zh_TW
Appears in Collections:Thesis


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