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dc.contributor.authorYARN, KFen_US
dc.contributor.authorCHANG, CYen_US
dc.contributor.authorWANG, YHen_US
dc.contributor.authorWANG, RLen_US
dc.date.accessioned2014-12-08T15:05:25Z-
dc.date.available2014-12-08T15:05:25Z-
dc.date.issued1990-12-01en_US
dc.identifier.issn0021-4922en_US
dc.identifier.urihttp://hdl.handle.net/11536/3957-
dc.description.abstractThis letter describes a power GaAs bipolar-unipolar transition negative differential transistor (BUNDR) using n+-i-p+-i-n+ structure prepared by molecular beam epitaxy (MBE). The peak-to-valley current ratios (PVRs), peak current densities and generated power outputs can be easily modulated by changing the third external base to emitter bias. A highest PVR of 140 with V(BE) = 0.5 V at room temperature has been obtained. For power consideration, it can be compared with resonant tunneling hot electron transistors. The bipolar-unipolar transition action was also confirmed experimentally.en_US
dc.language.isoen_USen_US
dc.subjectBIPOLAR-UNIPOLAR TRANSITION NEGATIVE DIFFERENTIAL RESISTANCE TRANSISTOR (BUNDR)en_US
dc.subjectPEAK-TO-VALLEY CURRENT RATIOS (PVRS)en_US
dc.subjectRESONANT TUNNELING HOT ELECTRON TRANSISTORen_US
dc.subjectBULK BARRIER TRANSISTORen_US
dc.subjectDIACen_US
dc.subjectBASE SHEET RESISTANCEen_US
dc.titleMOLECULAR-BEAM EPITAXY GROWN GAAS BIPOLAR-UNIPOLAR TRANSITION NEGATIVE DIFFERENTIAL RESISTANCE POWER TRANSISTORen_US
dc.typeArticle; Proceedings Paperen_US
dc.identifier.journalJAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERSen_US
dc.citation.volume29en_US
dc.citation.issue12en_US
dc.citation.spageL2411en_US
dc.citation.epageL2413en_US
dc.contributor.department電控工程研究所zh_TW
dc.contributor.departmentInstitute of Electrical and Control Engineeringen_US
dc.identifier.wosnumberWOS:A1990EP70300078-
Appears in Collections:Conferences Paper