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dc.contributor.authorDAI, CMen_US
dc.contributor.authorSU, CSen_US
dc.contributor.authorCHUU, DSen_US
dc.date.accessioned2014-12-08T15:05:26Z-
dc.date.available2014-12-08T15:05:26Z-
dc.date.issued1990-10-29en_US
dc.identifier.issn0003-6951en_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.103998en_US
dc.identifier.urihttp://hdl.handle.net/11536/3982-
dc.language.isoen_USen_US
dc.titleGROWTH OF HIGHLY ORIENTED TIN OXIDE THIN-FILMS BY LASER EVAPORATION DEPOSITIONen_US
dc.typeArticleen_US
dc.identifier.doi10.1063/1.103998en_US
dc.identifier.journalAPPLIED PHYSICS LETTERSen_US
dc.citation.volume57en_US
dc.citation.issue18en_US
dc.citation.spage1879en_US
dc.citation.epage1881en_US
dc.contributor.department電子物理學系zh_TW
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:A1990EF48900015-
dc.citation.woscount39-
Appears in Collections:Articles