<link rel="stylesheet" href="styles.cf390c6bfbe7555f.css">

LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION OF TIN AND ZRN THIN-FILMS FROM TI(NET2)4 AND ZR(NET2)4

Thumbnail Image

Date

1990-08-26

Authors


Journal Title

Journal ISSN

Volume Title

Publisher

DOI

Abstract

Description

Keywords

Citation

URI

https://ir.lib.nycu.edu.tw/handle/11536/4035

Collections

期刊論文;;Articles

Endorsement

Review

Supplemented By

Referenced By