LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION OF TIN AND ZRN THIN-FILMS FROM TI(NET2)4 AND ZR(NET2)4

標題:	LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION OF TIN AND ZRN THIN-FILMS FROM TI(NET2)4 AND ZR(NET2)4
作者:	CHIU, HT HUANG, CC 應用化學系 Department of Applied Chemistry
公開日期:	26-八月-1990
URI:	http://hdl.handle.net/11536/4035
ISSN:	0065-7727
期刊:	ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY
Volume:	200
Issue:
起始頁:	253
結束頁:	INOR
顯示於類別：	期刊論文