| 標題: | LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION OF TIN AND ZRN THIN-FILMS FROM TI(NET2)4 AND ZR(NET2)4 |
| 作者: | CHIU, HT HUANG, CC 應用化學系 Department of Applied Chemistry |
| 公開日期: | 26-Aug-1990 |
| URI: | http://hdl.handle.net/11536/4035 |
| ISSN: | 0065-7727 |
| 期刊: | ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY |
| Volume: | 200 |
| Issue: | |
| 起始頁: | 253 |
| 結束頁: | INOR |
| Appears in Collections: | Articles |

