標題: LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION OF TIN AND ZRN THIN-FILMS FROM TI(NET2)4 AND ZR(NET2)4
作者: CHIU, HT
HUANG, CC
應用化學系
Department of Applied Chemistry
公開日期: 26-Aug-1990
URI: http://hdl.handle.net/11536/4035
ISSN: 0065-7727
期刊: ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY
Volume: 200
Issue: 
起始頁: 253
結束頁: INOR
Appears in Collections:Articles