标题: 以酸硷型化学滤网吸附气态分子污染物之效能探讨
A STUDY ON THE CHEMICAL FILTER EFFICIENCY FOR THE ADSORPTION OF AIRBORNE MOLECULAR CONTAMINANTS
作者: 刘邦昱
白曛绫
工学院永续环境科技学程
关键字: 气态分子污染物质;化学滤网;外气空调箱;FFU系统;Airborne Molecular Contaminant;Chemical Filters;Makeup Air Unit;Fan Filter Unit System
公开日期: 2010
摘要: 随着国内高科技半导体技术不断发展下,制程元件与线宽已逐渐进入32奈米世代,如此高阶制程技术下,各制程环境中之气态分子污染物质(airborne molecular contaminant, AMC),已成为影响制程良率之关键因子,而气态分子污染物其污染途径,可藉由化学反应(酸硷反应、氧化还原反应)与产品元件产生反应或以物理性吸附沈积方式于晶圆表面或曝光镜头表面形成薄膜,将造成晶圆产品元件之缺陷或制程可靠度降低。目前国内各半导体厂已开始重视AMC议题,特别是12寸高阶晶圆厂,已经开始陆续于外气空调箱中、FFU系统、循环系统与微环境系统内使用气态污染控制技术“化学滤网”来解决AMC之问题,虽然化学滤网不是高科技厂房之主要核心生产设备,但其对制程良率的提升却扮演极重要关键的角色。本研究选择一本土自制组合式化学滤网,针对三种AMC污染物SO2/H2S及NH3,分别在实验室及实厂,研究探讨其处理效率、压损及寿命特性分析。
研究探讨结果显示针对化学滤网处理SO2/H2S及NH3之特性,在半导体或光电业界化学滤网一般采用的面风速2.5m/sec下,本研究结果得到该新型组合式化学滤网压损低于13mmAq、初始去除效率NH3型大于95%、SO2/H2S型大于90%、饱和吸附量大于100,000 ppbv*hr以上,符合实厂测试之性能需求。
With the continuous development of domestic high-tech semiconductor technology, the process components and line width have gradually entered the 32-nanometer generation. For this high-end process technology, the airborne molecular contaminant has been the one of the key factors that affect the process yield. The airborne molecular contaminants would induce chemical reaction (acid-base reactions, redox reactions) and the product components would be adsorbed or deposited on the wafer surface and result in wafer defects or process component of the lower reliability. Therefore semiconductor AMC issues have reached attentions, particularly by the high-end 12-inch wafer fab. Makeup Air Unit, Fan Filter Unit System, circulatory system, micro-environment system, and gaseous pollution control technologies using chemical filters have been used to solve the problem. In this study, chemical filters are evaluated for removing AMC pollutants of SO2, H2S and NH3. The processing efficiency, pressure loss and their life time are characterized. The research for using chemical filter to remove SO2, H2S and NH3 in the semiconductor or optical filters was done at a common surface wind speed of 2.5m/sec. The results of this study indicated that the low-pressure drop chemical filter of under 13mmAq was achieved, the initial removal efficiency was greater than 95% for NH3-type, and for SO2/H2S type it was greater than 90%.The total adsorption capacity was greater than 100,000 ppbv*hr. As a result, the chemical filter is in line with actual plant performance testing requirements.
URI: http://140.113.39.130/cdrfb3/record/nctu/#GT079376514
http://hdl.handle.net/11536/40699
显示于类别:Thesis