INFRARED SPECTROSCOPIC STUDY OF MERCURY-SENSITIZED PHOTO-CVD SILICON-OXIDE

Full metadata record

DC Field	Value	Language
dc.contributor.author	LAN, WH	en_US
dc.contributor.author	TU, SL	en_US
dc.contributor.author	YANG, SJ	en_US
dc.contributor.author	HUANG, KF	en_US
dc.date.accessioned	2014-12-08T15:05:33Z	-
dc.date.available	2014-12-08T15:05:33Z	-
dc.date.issued	1990-06-01	en_US
dc.identifier.issn	0021-4922	en_US
dc.identifier.uri	http://hdl.handle.net/11536/4091	-
dc.language.iso	en_US	en_US
dc.title	INFRARED SPECTROSCOPIC STUDY OF MERCURY-SENSITIZED PHOTO-CVD SILICON-OXIDE	en_US
dc.type	Article	en_US
dc.identifier.journal	JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS	en_US
dc.citation.volume	29	en_US
dc.citation.issue	6	en_US
dc.citation.spage	997	en_US
dc.citation.epage	1003	en_US
dc.contributor.department	電子物理學系	zh_TW
dc.contributor.department	光電工程學系	zh_TW
dc.contributor.department	Department of Electrophysics	en_US
dc.contributor.department	Department of Photonics	en_US
dc.identifier.wosnumber	WOS:A1990DM20800001	-
dc.citation.woscount	13	-
Appears in Collections:	Articles

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