IMPROVEMENT ON THE CURRENT-VOLTAGE CHARACTERISTICS OF POLYCRYSTALLINE SILICON CONTACTED N+-P JUNCTIONS WITH HIGH-FIELD STRESSING

doi:10.1063/1.102606

標題:	IMPROVEMENT ON THE CURRENT-VOLTAGE CHARACTERISTICS OF POLYCRYSTALLINE SILICON CONTACTED N+-P JUNCTIONS WITH HIGH-FIELD STRESSING
作者:	WU, SL LEE, CL LEI, TF 交大名義發表電控工程研究所 National Chiao Tung University Institute of Electrical and Control Engineering
公開日期:	12-三月-1990
URI:	http://dx.doi.org/10.1063/1.102606 http://hdl.handle.net/11536/4156
ISSN:	0003-6951
DOI:	10.1063/1.102606
期刊:	APPLIED PHYSICS LETTERS
Volume:	56
Issue:	11
起始頁:	1031
結束頁:	1033
顯示於類別：	期刊論文