標題: | 使用標準矽製程之蕭特基二極體的60-GHz雙次升/降頻器與PHEMT功率放大器 60-GHz Dual-Conversion Up/Down Converters Using Schottky Diode on Standard Silicon IC Process and PHEMT Power Amplifier |
作者: | 羅泰麟 Lo, Tai-Lin 孟慶宗 Meng, Chin-chun 電信工程研究所 |
關鍵字: | 蕭特基二極體;標準矽製程;功率放大器;Schottky Diode;Standard Silicon IC Process;Power Amplifier |
公開日期: | 2008 |
摘要: | 本篇論文主要分為兩個主題,分別實現不同的射頻電路。第一,在 CMOS 0.18□m及SiGe BiCMOS 0.35□m製程上實現蕭特基二極體來達到可以把RF頻率操作在60 GHz,並且分別設計了傳輸機以及接收機。傳輸機利用了T-Coil來延升頻寬。第二,利用在pHMET 0.15□m製程上實現一個操作在60GHz的功率放大器,以及利用mHEMT 0.15□m製程設計一個電路驗證flip-chip可以運用在V-band頻段。 This paper included two parts. First, the Schottky diodes were fabricated in 0.18 □m CMOS process and 0.35 □m SiGe BiCMOS process for operating RF band in 60 GHz, and implementing a transmitter and a receiver , respectively. The transmitter utilized the T-coil to extend the bandwidth. The other part demonstrated a 60GHz power amplifier realized in 0.15□m pHEMT process, and the flip-chip technique could be applied in V-Band by using 0.15□m mHEMT process. |
URI: | http://140.113.39.130/cdrfb3/record/nctu/#GT079613571 http://hdl.handle.net/11536/42007 |
顯示於類別: | 畢業論文 |