CONTACT RESISTIVITIES OF AL AND TI ON SI MEASURED BY A SELF-ALIGNED VERTICAL KELVIN TEST RESISTOR STRUCTURE

Full metadata record

DC Field	Value	Language
dc.contributor.author	WEN, LY	en_US
dc.contributor.author	TAN, FL	en_US
dc.contributor.author	CHUNG, LL	en_US
dc.date.accessioned	2014-12-08T15:05:44Z	-
dc.date.available	2014-12-08T15:05:44Z	-
dc.date.issued	1989-11-01	en_US
dc.identifier.issn	0038-1101	en_US
dc.identifier.uri	http://hdl.handle.net/11536/4266	-
dc.language.iso	en_US	en_US
dc.title	CONTACT RESISTIVITIES OF AL AND TI ON SI MEASURED BY A SELF-ALIGNED VERTICAL KELVIN TEST RESISTOR STRUCTURE	en_US
dc.type	Article	en_US
dc.identifier.journal	SOLID-STATE ELECTRONICS	en_US
dc.citation.volume	32	en_US
dc.citation.issue	11	en_US
dc.citation.spage	997	en_US
dc.citation.epage	1001	en_US
dc.contributor.department	交大名義發表	zh_TW
dc.contributor.department	電控工程研究所	zh_TW
dc.contributor.department	National Chiao Tung University	en_US
dc.contributor.department	Institute of Electrical and Control Engineering	en_US
dc.identifier.wosnumber	WOS:A1989CB85900011	-
dc.citation.woscount	0	-
Appears in Collections:	Articles