Full metadata record
DC FieldValueLanguage
dc.contributor.author李亨元en_US
dc.contributor.authorHengyuan Leeen_US
dc.contributor.author陳明哲en_US
dc.contributor.authorMing Jer Chenen_US
dc.date.accessioned2014-12-12T01:31:36Z-
dc.date.available2014-12-12T01:31:36Z-
dc.date.issued2003en_US
dc.identifier.urihttp://140.113.39.130/cdrfb3/record/nctu/#GT009111522en_US
dc.identifier.urihttp://hdl.handle.net/11536/42846-
dc.description.abstract在本論文中,我們建構了可以模擬應變矽的金氧半場效電晶體元件的程式,該程式可以自我相容地解一維的Schrödinger和Poisson方程式,利用這個程式,我們研究了一些應變矽元件的量子化特性,特別是元件在彈道傳輸下的效能極限,以及直接穿隧的閘極漏電流。最後,我們提出並檢驗一種利用應變矽的雙閘極元件的架構,以量產的觀點來說,這種元件比傳統的雙閘極元件更具實用價值且有更好的元件特性。zh_TW
dc.description.abstractA 1-D self-consistent Schrödinger-Poisson solver for dealing with strained Si MOSFETs has been successfully constructed in this thesis. Several quantum mechanical properties of strained Si devices have also been studied, especially the ballistic performance limit and the gate direct tunneling current. Finally, a strained double gate device has been proposed and examined. This new device might provide a more practical way from the manufacturability point of view while being able to create device performance superior over traditional double gate devices.en_US
dc.language.isoen_USen_US
dc.subject矽鍺zh_TW
dc.subject應變矽zh_TW
dc.subject彈道傳輸zh_TW
dc.subject閘極直接穿隧電流zh_TW
dc.subjectSiGeen_US
dc.subjectstrained Sien_US
dc.subjectballistic transporten_US
dc.subjectgate direct tunneling cuurenten_US
dc.title應變矽的金屬氧化物半導體場效電晶體zh_TW
dc.titleQuantum Simulation of Strained Si MOSFETen_US
dc.typeThesisen_US
dc.contributor.department電子研究所zh_TW
Appears in Collections:Thesis


Files in This Item:

  1. 152201.pdf

If it is a zip file, please download the file and unzip it, then open index.html in a browser to view the full text content.