標題: | COMPOSITIONAL DEPENDENCE OF THERMAL-STABILITY OF REFRACTORY-METAL SILICIDE SCHOTTKY CONTACTS TO GAAS |
作者: | LEE, CP LIU, TH WU, SC 奈米中心 Nano Facility Center |
公開日期: | 1-Sep-1989 |
URI: | http://dx.doi.org/10.1007/BF02657477 http://hdl.handle.net/11536/4302 |
ISSN: | 0361-5235 |
DOI: | 10.1007/BF02657477 |
期刊: | JOURNAL OF ELECTRONIC MATERIALS |
Volume: | 18 |
Issue: | 5 |
起始頁: | 623 |
結束頁: | 626 |
Appears in Collections: | Articles |