COBALT SILICIDE INTERCONNECTION FROM A SI/W/CO TRILAYER STRUCTURE

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DC Field	Value	Language
dc.contributor.author	LIN, MZ	en_US
dc.contributor.author	WU, CY	en_US
dc.date.accessioned	2014-12-08T15:05:55Z	-
dc.date.available	2014-12-08T15:05:55Z	-
dc.date.issued	1989-01-01	en_US
dc.identifier.issn	0013-4651	en_US
dc.identifier.uri	http://hdl.handle.net/11536/4459	-
dc.language.iso	en_US	en_US
dc.title	COBALT SILICIDE INTERCONNECTION FROM A SI/W/CO TRILAYER STRUCTURE	en_US
dc.type	Article	en_US
dc.identifier.journal	JOURNAL OF THE ELECTROCHEMICAL SOCIETY	en_US
dc.citation.volume	136	en_US
dc.citation.issue	1	en_US
dc.citation.spage	258	en_US
dc.citation.epage	262	en_US
dc.contributor.department	電子工程學系及電子研究所	zh_TW
dc.contributor.department	Department of Electronics Engineering and Institute of Electronics	en_US
dc.identifier.wosnumber	WOS:A1989R901500046	-
dc.citation.woscount	5	-
Appears in Collections:	Articles

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