標題: BARRIER EFFECT OF E-BEAM EVAPORATED TUNGSTEN INTERLAYER IN AL/W/PTSI METALLIZATION LAYER
作者: CHIOU, BS
LO, HS
CHANG, PH
電控工程研究所
Institute of Electrical and Control Engineering
公開日期: 1-Sep-1988
URI: http://dx.doi.org/10.1007/BF02652125
http://hdl.handle.net/11536/4490
ISSN: 0361-5235
DOI: 10.1007/BF02652125
期刊: JOURNAL OF ELECTRONIC MATERIALS
Volume: 17
Issue: 5
起始頁: 397
結束頁: 404
Appears in Collections:Articles