A CONTROLLED RADIATION SOURCE AND ELECTRON X-RAY FLUX RATIOS IN AN ELECTRON-BEAM METAL EVAPORATOR

doi:10.1007/BF02652106

標題:	A CONTROLLED RADIATION SOURCE AND ELECTRON X-RAY FLUX RATIOS IN AN ELECTRON-BEAM METAL EVAPORATOR
作者:	BHATTACHARYA, PK REISMAN, A CHEN, MC 交大名義發表 National Chiao Tung University
公開日期:	1-七月-1988
URI:	http://dx.doi.org/10.1007/BF02652106 http://hdl.handle.net/11536/4510
ISSN:	0361-5235
DOI:	10.1007/BF02652106
期刊:	JOURNAL OF ELECTRONIC MATERIALS
Volume:	17
Issue:	4
起始頁:	273
結束頁:	283
顯示於類別：	期刊論文