ELLIPSOMETRY MEASUREMENTS ON SIO2-FILMS FOR THICKNESSES UNDER 200-A

完整後設資料紀錄

DC 欄位	值	語言
dc.contributor.author	HO, JH	en_US
dc.contributor.author	LEE, CL	en_US
dc.contributor.author	JEN, CW	en_US
dc.contributor.author	LEI, TF	en_US
dc.date.accessioned	2014-12-08T15:06:03Z	-
dc.date.available	2014-12-08T15:06:03Z	-
dc.date.issued	1987-09-01	en_US
dc.identifier.issn	0038-1101	en_US
dc.identifier.uri	http://hdl.handle.net/11536/4621	-
dc.language.iso	en_US	en_US
dc.title	ELLIPSOMETRY MEASUREMENTS ON SIO2-FILMS FOR THICKNESSES UNDER 200-A	en_US
dc.type	Article	en_US
dc.identifier.journal	SOLID-STATE ELECTRONICS	en_US
dc.citation.volume	30	en_US
dc.citation.issue	9	en_US
dc.citation.spage	973	en_US
dc.citation.epage	981	en_US
dc.contributor.department	交大名義發表	zh_TW
dc.contributor.department	電控工程研究所	zh_TW
dc.contributor.department	National Chiao Tung University	en_US
dc.contributor.department	Institute of Electrical and Control Engineering	en_US
dc.identifier.wosnumber	WOS:A1987K009500012	-
dc.citation.woscount	26	-
顯示於類別：	期刊論文