A NEW OXIDATION-RESISTANT SELF-ALIGNED TISI2 PROCESS

Full metadata record

DC Field	Value	Language
dc.contributor.author	TSENG, HH	en_US
dc.contributor.author	WU, CY	en_US
dc.date.accessioned	2014-12-08T15:06:08Z	-
dc.date.available	2014-12-08T15:06:08Z	-
dc.date.issued	1986-11-01	en_US
dc.identifier.issn	0741-3106	en_US
dc.identifier.uri	http://hdl.handle.net/11536/4704	-
dc.language.iso	en_US	en_US
dc.title	A NEW OXIDATION-RESISTANT SELF-ALIGNED TISI2 PROCESS	en_US
dc.type	Article	en_US
dc.identifier.journal	IEEE ELECTRON DEVICE LETTERS	en_US
dc.citation.volume	7	en_US
dc.citation.issue	11	en_US
dc.citation.spage	623	en_US
dc.citation.epage	624	en_US
dc.contributor.department	工學院	zh_TW
dc.contributor.department	College of Engineering	en_US
dc.identifier.wosnumber	WOS:A1986E528000011	-
dc.citation.woscount	12	-
Appears in Collections:	Articles

Files in This Item:

If it is a zip file, please download the file and unzip it, then open index.html in a browser to view the full text content.