A NEW OXIDATION-RESISTANT SELF-ALIGNED TISI2 PROCESS

Title:	A NEW OXIDATION-RESISTANT SELF-ALIGNED TISI2 PROCESS
Authors:	TSENG, HH WU, CY 工學院 College of Engineering
Issue Date:	1-Nov-1986
URI:	http://hdl.handle.net/11536/4704
ISSN:	0741-3106
Journal:	IEEE ELECTRON DEVICE LETTERS
Volume:	7
Issue:	11
Begin Page:	623
End Page:	624
Appears in Collections:	Articles

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