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dc.contributor.authorCHIEN, HCen_US
dc.contributor.authorASHOK, Sen_US
dc.date.accessioned2014-12-08T15:06:09Z-
dc.date.available2014-12-08T15:06:09Z-
dc.date.issued1986-09-01en_US
dc.identifier.issn0361-5235en_US
dc.identifier.urihttp://hdl.handle.net/11536/4725-
dc.language.isoen_USen_US
dc.titleSTUDIES ON ARGON ION IMPLANT DAMAGED SILICON SURFACE BARRIERSen_US
dc.typeMeeting Abstracten_US
dc.identifier.journalJOURNAL OF ELECTRONIC MATERIALSen_US
dc.citation.volume15en_US
dc.citation.issue5en_US
dc.citation.spage296en_US
dc.citation.epage296en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:A1986E194800025-
dc.citation.woscount0-
顯示於類別:期刊論文