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DC FieldValueLanguage
dc.contributor.authorCHEN, CFen_US
dc.contributor.authorWU, CYen_US
dc.date.accessioned2014-12-08T15:06:12Z-
dc.date.available2014-12-08T15:06:12Z-
dc.date.issued1986-01-13en_US
dc.identifier.issn0003-6951en_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.97029en_US
dc.identifier.urihttp://hdl.handle.net/11536/4771-
dc.language.isoen_USen_US
dc.titleSUPERIOR CHARACTERISTICS OF NITRIDIZED THERMAL OXIDE GROWN ON POLYCRYSTALLINE SILICONen_US
dc.typeArticleen_US
dc.identifier.doi10.1063/1.97029en_US
dc.identifier.journalAPPLIED PHYSICS LETTERSen_US
dc.citation.volume48en_US
dc.citation.issue2en_US
dc.citation.spage165en_US
dc.citation.epage167en_US
dc.contributor.department交大名義發表zh_TW
dc.contributor.department工學院zh_TW
dc.contributor.departmentNational Chiao Tung Universityen_US
dc.contributor.departmentCollege of Engineeringen_US
dc.identifier.wosnumberWOS:A1986AXV0300029-
dc.citation.woscount4-
Appears in Collections:Articles


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