標題: | STUDY OF ELECTRICAL CHARACTERISTICS ON THERMALLY NITRIDED SIO2 (NITROXIDE) FILMS |
作者: | CHEN, CT TSENG, FC CHANG, CY LEE, MK 電控工程研究所 Institute of Electrical and Control Engineering |
公開日期: | 1984 |
URI: | http://hdl.handle.net/11536/4869 |
ISSN: | 0013-4651 |
期刊: | JOURNAL OF THE ELECTROCHEMICAL SOCIETY |
Volume: | 131 |
Issue: | 4 |
起始頁: | 875 |
結束頁: | 877 |
Appears in Collections: | Articles |
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