OXIDATION RESISTANCE CHARACTERISTICS OF SILICON THERMAL NITRIDE FILMS

標題:	OXIDATION RESISTANCE CHARACTERISTICS OF SILICON THERMAL NITRIDE FILMS
作者:	WU, CY KING, CW LEE, MK CHEN, CT SHIH, CT 電控工程研究所 Institute of Electrical and Control Engineering
公開日期:	1983
URI:	http://hdl.handle.net/11536/4944
ISSN:	0013-4651
期刊:	JOURNAL OF THE ELECTROCHEMICAL SOCIETY
Volume:	130
Issue:	2
起始頁:	458
結束頁:	462
Appears in Collections:	Articles

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