完整後設資料紀錄
DC 欄位語言
dc.contributor.authorWU, CYen_US
dc.contributor.authorKING, CWen_US
dc.contributor.authorLEE, MKen_US
dc.contributor.authorCHEN, CTen_US
dc.date.accessioned2014-12-08T15:06:23Z-
dc.date.available2014-12-08T15:06:23Z-
dc.date.issued1982en_US
dc.identifier.issn0013-4651en_US
dc.identifier.urihttp://hdl.handle.net/11536/4955-
dc.language.isoen_USen_US
dc.titleGROWTH-KINETICS OF SILICON THERMAL NITRIDATIONen_US
dc.typeArticleen_US
dc.identifier.journalJOURNAL OF THE ELECTROCHEMICAL SOCIETYen_US
dc.citation.volume129en_US
dc.citation.issue7en_US
dc.citation.spage1559en_US
dc.citation.epage1563en_US
dc.contributor.department電控工程研究所zh_TW
dc.contributor.departmentInstitute of Electrical and Control Engineeringen_US
dc.identifier.wosnumberWOS:A1982NW36700032-
dc.citation.woscount41-
顯示於類別:期刊論文


文件中的檔案:

  1. A1982NW36700032.pdf

若為 zip 檔案,請下載檔案解壓縮後,用瀏覽器開啟資料夾中的 index.html 瀏覽全文。