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DC FieldValueLanguage
dc.contributor.authorLU, NCCen_US
dc.contributor.authorLU, CYen_US
dc.contributor.authorLEE, MKen_US
dc.contributor.authorSHIH, CCen_US
dc.contributor.authorWANG, CSen_US
dc.contributor.authorSHENG, TTen_US
dc.contributor.authorREUTER, Wen_US
dc.date.accessioned2014-12-08T15:06:25Z-
dc.date.available2014-12-08T15:06:25Z-
dc.date.issued1982en_US
dc.identifier.issn0013-4651en_US
dc.identifier.urihttp://hdl.handle.net/11536/4986-
dc.language.isoen_USen_US
dc.titleCHARACTERIZATION OF MONOLITHIC POLYCRYSTALLINE-SILICON RESISTORS IN SUB-MICRON THICKNESSen_US
dc.typeMeeting Abstracten_US
dc.identifier.journalJOURNAL OF THE ELECTROCHEMICAL SOCIETYen_US
dc.citation.volume129en_US
dc.citation.issue8en_US
dc.citation.spageC331en_US
dc.citation.epageC331en_US
dc.contributor.department交大名義發表zh_TW
dc.contributor.departmentNational Chiao Tung Universityen_US
dc.identifier.wosnumberWOS:A1982PA69100286-
dc.citation.woscount0-
Appears in Collections:Articles


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