標題: | REDISTRIBUTION OF DEPOSITED BORON IN SILICON DURING DRY O2 AND TCE O2 OXIDATIONS |
作者: | GUO, SF CHU, TY 交大名義發表 National Chiao Tung University |
公開日期: | 1980 |
URI: | http://hdl.handle.net/11536/5076 |
ISSN: | 0013-4651 |
期刊: | JOURNAL OF THE ELECTROCHEMICAL SOCIETY |
Volume: | 127 |
Issue: | 3 |
起始頁: | C93 |
結束頁: | C93 |
顯示於類別: | 期刊論文 |