REDISTRIBUTION OF DEPOSITED BORON IN SILICON DURING DRY O2 AND TCE O2 OXIDATIONS

Title:	REDISTRIBUTION OF DEPOSITED BORON IN SILICON DURING DRY O2 AND TCE O2 OXIDATIONS
Authors:	GUO, SF CHU, TY 交大名義發表 National Chiao Tung University
Issue Date:	1980
URI:	http://hdl.handle.net/11536/5076
ISSN:	0013-4651
Journal:	JOURNAL OF THE ELECTROCHEMICAL SOCIETY
Volume:	127
Issue:	3
Begin Page:	C93
End Page:	C93
Appears in Collections:	Articles