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| The influences of surface treatment and gas annealing conditions on the inversion behaviors of the atomic-layer-deposition Al(2)O(3)/n-In(0.53)Ga(0.47)As metal-oxide-semiconductor capacitor | 106 |
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| June 2024 | July 2024 | August 2024 | September 2024 | October 2024 | November 2024 | December 2024 | |
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| The influences of surface treatment and gas annealing conditions on the inversion behaviors of the atomic-layer-deposition Al(2)O(3)/n-In(0.53)Ga(0.47)As metal-oxide-semiconductor capacitor | 1 | 0 | 0 | 0 | 0 | 0 | 3 |
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