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dc.contributor.author楊立昌en_US
dc.contributor.authorYang, Li-Changen_US
dc.contributor.author謝正雄en_US
dc.contributor.authorXie, Zheng-Xiongen_US
dc.date.accessioned2014-12-12T02:01:53Z-
dc.date.available2014-12-12T02:01:53Z-
dc.date.issued1980en_US
dc.identifier.urihttp://140.113.39.130/cdrfb3/record/nctu/#NT694123007en_US
dc.identifier.urihttp://hdl.handle.net/11536/51308-
dc.description.abstract本文研究蒸鍍在PZT 與玻璃基座上Te薄膜的特性。測量Te薄膜的導電性與霍爾效應我 們觀察Te薄膜電的特性, 并利用10.6μm 的CO 雷射觀察PZT 的焦電效應, 我們提出 一簡單模型解釋該現象。zh_TW
dc.language.isozh_TWen_US
dc.subject蒸鍍zh_TW
dc.subject焦電材料zh_TW
dc.subject基座上zh_TW
dc.subject薄膜特性zh_TW
dc.subject焦電效應zh_TW
dc.subject光電學zh_TW
dc.subject光學zh_TW
dc.subject雷射學zh_TW
dc.subject光電工程zh_TW
dc.subjectPETen_US
dc.subjectTEen_US
dc.subjectELECTRO-OPTICS-ENGINEERINGen_US
dc.subjectOPTICSen_US
dc.subjectLASERen_US
dc.subjectOPTI-ELECTRONIC-ENGINEERINGen_US
dc.title蒸鍍在焦電材料PZT 基座上Te 薄膜特性之研究zh_TW
dc.typeThesisen_US
dc.contributor.department光電工程學系zh_TW
Appears in Collections:Thesis


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