標題: | Design of 2xVDD-Tolerant Power-Rail ESD Clamp Circuit With Consideration of Gate Leakage Current in 65-nm CMOS Technology |
作者: | Wang, Chang-Tzu Ker, Ming-Dou 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics |
關鍵字: | Electrostatic discharge (ESD);gate leakage;mixed-voltage input/output (I/O);silicon-controlled rectifier (SCR) |
公開日期: | 1-六月-2010 |
摘要: | A low-leakage 2xVDD-tolerant power-rail electrostatic discharge (ESD) clamp circuit composed of the silicon-controlled rectifier (SCR) device and new ESD detection circuit, realized with only thin-oxide 1xVDD devices, has been proposed with consideration of gate leakage current. By reducing the voltage across the gate oxides of the devices in the ESD detection circuit, the whole power-rail ESD clamp circuit can achieve an ultralow standby leakage current. The new proposed circuit has successfully been verified in a 1-V 65-nm CMOS process, which can achieve 6.5-kV human-body-model and 350-V machine-model ESD levels under ESD stresses, but only consumes a standby leakage current of 0.15 mu A at room temperature under normal circuit operating conditions with 1.8-V bias. |
URI: | http://dx.doi.org/10.1109/TED.2010.2046457 http://hdl.handle.net/11536/5299 |
ISSN: | 0018-9383 |
DOI: | 10.1109/TED.2010.2046457 |
期刊: | IEEE TRANSACTIONS ON ELECTRON DEVICES |
Volume: | 57 |
Issue: | 6 |
起始頁: | 1460 |
結束頁: | 1465 |
顯示於類別: | 期刊論文 |