標題: Design of 2xVDD-Tolerant Power-Rail ESD Clamp Circuit With Consideration of Gate Leakage Current in 65-nm CMOS Technology
作者: Wang, Chang-Tzu
Ker, Ming-Dou
電子工程學系及電子研究所
Department of Electronics Engineering and Institute of Electronics
關鍵字: Electrostatic discharge (ESD);gate leakage;mixed-voltage input/output (I/O);silicon-controlled rectifier (SCR)
公開日期: 1-六月-2010
摘要: A low-leakage 2xVDD-tolerant power-rail electrostatic discharge (ESD) clamp circuit composed of the silicon-controlled rectifier (SCR) device and new ESD detection circuit, realized with only thin-oxide 1xVDD devices, has been proposed with consideration of gate leakage current. By reducing the voltage across the gate oxides of the devices in the ESD detection circuit, the whole power-rail ESD clamp circuit can achieve an ultralow standby leakage current. The new proposed circuit has successfully been verified in a 1-V 65-nm CMOS process, which can achieve 6.5-kV human-body-model and 350-V machine-model ESD levels under ESD stresses, but only consumes a standby leakage current of 0.15 mu A at room temperature under normal circuit operating conditions with 1.8-V bias.
URI: http://dx.doi.org/10.1109/TED.2010.2046457
http://hdl.handle.net/11536/5299
ISSN: 0018-9383
DOI: 10.1109/TED.2010.2046457
期刊: IEEE TRANSACTIONS ON ELECTRON DEVICES
Volume: 57
Issue: 6
起始頁: 1460
結束頁: 1465
顯示於類別:期刊論文


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