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dc.contributor.authorWang, Chang-Tzuen_US
dc.contributor.authorKer, Ming-Douen_US
dc.date.accessioned2014-12-08T15:06:44Z-
dc.date.available2014-12-08T15:06:44Z-
dc.date.issued2010-06-01en_US
dc.identifier.issn0018-9383en_US
dc.identifier.urihttp://dx.doi.org/10.1109/TED.2010.2046457en_US
dc.identifier.urihttp://hdl.handle.net/11536/5299-
dc.description.abstractA low-leakage 2xVDD-tolerant power-rail electrostatic discharge (ESD) clamp circuit composed of the silicon-controlled rectifier (SCR) device and new ESD detection circuit, realized with only thin-oxide 1xVDD devices, has been proposed with consideration of gate leakage current. By reducing the voltage across the gate oxides of the devices in the ESD detection circuit, the whole power-rail ESD clamp circuit can achieve an ultralow standby leakage current. The new proposed circuit has successfully been verified in a 1-V 65-nm CMOS process, which can achieve 6.5-kV human-body-model and 350-V machine-model ESD levels under ESD stresses, but only consumes a standby leakage current of 0.15 mu A at room temperature under normal circuit operating conditions with 1.8-V bias.en_US
dc.language.isoen_USen_US
dc.subjectElectrostatic discharge (ESD)en_US
dc.subjectgate leakageen_US
dc.subjectmixed-voltage input/output (I/O)en_US
dc.subjectsilicon-controlled rectifier (SCR)en_US
dc.titleDesign of 2xVDD-Tolerant Power-Rail ESD Clamp Circuit With Consideration of Gate Leakage Current in 65-nm CMOS Technologyen_US
dc.typeArticleen_US
dc.identifier.doi10.1109/TED.2010.2046457en_US
dc.identifier.journalIEEE TRANSACTIONS ON ELECTRON DEVICESen_US
dc.citation.volume57en_US
dc.citation.issue6en_US
dc.citation.spage1460en_US
dc.citation.epage1465en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000277884100035-
dc.citation.woscount5-
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