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dc.contributor.authorHuang, H. W.en_US
dc.contributor.authorHuang, J. K.en_US
dc.contributor.authorLee, K. Y.en_US
dc.contributor.authorLin, C. F.en_US
dc.contributor.authorKuo, H. C.en_US
dc.date.accessioned2014-12-08T15:06:48Z-
dc.date.available2014-12-08T15:06:48Z-
dc.date.issued2010-06-01en_US
dc.identifier.issn0741-3106en_US
dc.identifier.urihttp://dx.doi.org/10.1109/LED.2010.2045218en_US
dc.identifier.urihttp://hdl.handle.net/11536/5333-
dc.description.abstractGaN-based LEDs with a SiO(2) oxide PQC pattern on an n-GaN layer by nanoimprint lithography are fabricated and investigated. At a driving current of 20 mA on a Transistor-Outline-can package, the light output power of LED III (d = 1.2 mu m) was enhanced by a factor of 1.20. The internal-quantum-efficiency result offers promising potential to enhance the light output power of commercial light-emitting devices with a SiO(2) oxide PQC structure on an n-GaN layer.en_US
dc.language.isoen_USen_US
dc.titleLight-Output-Power Enhancement of GaN-Based Light-Emitting Diodes on an n-GaN Layer Using a SiO(2) Photonic Quasi-Crystal Overgrowthen_US
dc.typeArticleen_US
dc.identifier.doi10.1109/LED.2010.2045218en_US
dc.identifier.journalIEEE ELECTRON DEVICE LETTERSen_US
dc.citation.volume31en_US
dc.citation.issue6en_US
dc.citation.spage573en_US
dc.citation.epage575en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
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