| 標題: | Light-Output-Power Enhancement of GaN-Based Light-Emitting Diodes on an n-GaN Layer Using a SiO2 Photonic Quasi-Crystal Overgrowth |
| 作者: | Huang, H. W. Huang, J. K. Lee, K. Y. Lin, C. F. Kuo, H. C. 光電工程研究所 Institute of EO Enginerring |
| 關鍵字: | Gallium nitride (GaN);light-emitting diodes (LEDs);photonic quasi-crystal (PQC) |
| 公開日期: | 1-六月-2010 |
| 摘要: | GaN-based LEDs with a SiO2 oxide PQC pattern on an n-GaN layer by nanoimprint lithography are fabricated and investigated. At a driving current of 20 mA on a Transistor-Outline-can package, the light output power of LED III (d = 1.2 mu m) was enhanced by a factor of 1.20. The internal-quantum-efficiency result offers promising potential to enhance the light output power of commercial light-emitting devices with a SiO2 oxide PQC structure on an n-GaN layer. |
| URI: | http://dx.doi.org/10.1109/LED.2010.2045218 http://hdl.handle.net/11536/150151 |
| ISSN: | 0741-3106 |
| DOI: | 10.1109/LED.2010.2045218 |
| 期刊: | IEEE ELECTRON DEVICE LETTERS |
| Volume: | 31 |
| 起始頁: | 573 |
| 結束頁: | 575 |
| 顯示於類別: | 期刊論文 |

