完整後設資料紀錄
DC 欄位語言
dc.contributor.author龔安井en_US
dc.contributor.authorAn-Jing Gongen_US
dc.contributor.author林育德en_US
dc.contributor.authorYu-De Linen_US
dc.date.accessioned2014-12-12T02:10:51Z-
dc.date.available2014-12-12T02:10:51Z-
dc.date.issued1992en_US
dc.identifier.urihttp://140.113.39.130/cdrfb3/record/nctu/#NT810436059en_US
dc.identifier.urihttp://hdl.handle.net/11536/57044-
dc.description.abstract本論文中提出一推廣後的頻域分析法,來分析介質層有不等寬度外壁的問 題.等效原理和頻域法的結合,利用磁流等效來分離兩個不等外壁的區域, 然後利用傳統頻域法來推導公式.此法可應用來研究有限金屬厚度和架設 凹槽對鰭線傳輸特性的影響.對於共平面波導,其有限金屬厚度和架設空橋 的影響,亦可處理.另外,和擾動法的結合,可用來顯現鰭線上的集膚效應和 金屬厚度對金屬表面上導体漏失的影響.對於架設凹槽,鰭線之鰭寬度,鰭 線四壁的影響,亦在探討範圍內. A new and generalized spectral domain approach is used to derive dispersion characteristics of transmission lines with different sidewall widths in different layers. The new formulation utilizes the equivalence principle to separate two different regions. Magnetic surface currents are identified as the unknowns at the aperture separating the two regions. The resulting equivalences can then be treated with the immittance approach as in conventional spectral domain approach. The formulation procedure is systematic and can treat a variety of structures. It is applied to analyze the effects of metal thickness and mounting grooves on propagation characteristics of finlines. The CPW with finite metal thickness, microshield line, and CPW airbridge could also be treated. Further, the generalized spectral domain approach combined with perturbational method, is used to characterize the skin effects of finlines. This method is used to take into account the influence of metallization thickness on the conductor loss. The effects of mounting grooves, fin width of finlines, and enclosing sidewalls are also discussed.zh_TW
dc.language.isoen_USen_US
dc.subject頻域,鰭線,導体漏失,空橋,共平面波導,金屬厚度zh_TW
dc.subjectspectral domain; finline; conductor loss; air bridge; coplanar waveguide; mental thicknessen_US
dc.title鰭線之導体漏失和具有限金屬厚度之共平面波導的特性zh_TW
dc.titleConductor Losses in Finlines and Coplanar Waveguides with Finiteen_US
dc.typeThesisen_US
dc.contributor.department電信工程研究所zh_TW
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