利用超高真空化學氣相沉積術成長多晶矽與多晶矽鍺薄膜及其材料特性與元件應用之研究

Full metadata record

DC Field	Value	Language
dc.contributor.author	林鴻志	en_US
dc.contributor.author	Lin, Hong Zhi	en_US
dc.date.accessioned	2014-12-12T02:12:49Z	-
dc.date.available	2014-12-12T02:12:49Z	-
dc.date.issued	1993	en_US
dc.identifier.uri	http://140.113.39.130/cdrfb3/record/nctu/#NT822430030	en_US
dc.identifier.uri	http://hdl.handle.net/11536/58544	-
dc.language.iso	en_US	en_US
dc.title	利用超高真空化學氣相沉積術成長多晶矽與多晶矽鍺薄膜及其材料特性與元件應用之研究	zh_TW
dc.title	Characterization and device applications of polycrystalline si and Si1-xGex films grown by ultra-high vacuum chemical vapor deposition	en_US
dc.type	Thesis	en_US
dc.contributor.department	電子研究所	zh_TW
Appears in Collections:	Thesis