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dc.contributor.author林鴻志en_US
dc.contributor.authorLin, Hong Zhien_US
dc.date.accessioned2014-12-12T02:12:49Z-
dc.date.available2014-12-12T02:12:49Z-
dc.date.issued1993en_US
dc.identifier.urihttp://140.113.39.130/cdrfb3/record/nctu/#NT822430030en_US
dc.identifier.urihttp://hdl.handle.net/11536/58544-
dc.language.isoen_USen_US
dc.title利用超高真空化學氣相沉積術成長多晶矽與多晶矽鍺薄膜及其材料特性與元件應用之研究zh_TW
dc.titleCharacterization and device applications of polycrystalline si and Si1-xGex films grown by ultra-high vacuum chemical vapor depositionen_US
dc.typeThesisen_US
dc.contributor.department電子研究所zh_TW
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