完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | 林鴻志 | en_US |
dc.contributor.author | Lin, Hong Zhi | en_US |
dc.date.accessioned | 2014-12-12T02:12:49Z | - |
dc.date.available | 2014-12-12T02:12:49Z | - |
dc.date.issued | 1993 | en_US |
dc.identifier.uri | http://140.113.39.130/cdrfb3/record/nctu/#NT822430030 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/58544 | - |
dc.language.iso | en_US | en_US |
dc.title | 利用超高真空化學氣相沉積術成長多晶矽與多晶矽鍺薄膜及其材料特性與元件應用之研究 | zh_TW |
dc.title | Characterization and device applications of polycrystalline si and Si1-xGex films grown by ultra-high vacuum chemical vapor deposition | en_US |
dc.type | Thesis | en_US |
dc.contributor.department | 電子研究所 | zh_TW |
顯示於類別: | 畢業論文 |