標題: | 30-GHz Low-Noise Performance of 100-nm-Gate-Recessed n-GaN/AlGaN/GaN HEMTs |
作者: | Chang, Chia-Ta Hsu, Heng-Tung Chang, Edward Yi Kuo, Chien-I Huang, Jui-Chien Lu, Chung-Yu Miyamoto, Yasuyuki 材料科學與工程學系 電子工程學系及電子研究所 Department of Materials Science and Engineering Department of Electronics Engineering and Institute of Electronics |
關鍵字: | AlGaN/GaN;high-electron mobility transistor (HEMT);noise figure;recessed gate |
公開日期: | 1-Feb-2010 |
摘要: | We demonstrate a 100-nm-gate-recessed n-GaN/AlGaN/GaN high-electron mobility transistor (HEMT) with low-noise properties at 30 GHz. The recessed GaN HEMT exhibits a low ohmic-contact resistance of 0.28 Omega . mm and a low gate leakage current of 0.9 mu A/mm when biased at V(GS) = -3 V and V(DS) = 10 V. At the same bias point, a minimum noise figure of 1.6 dB at 30 GHz and an associated gain of 5 dB were achieved. To the best of our knowledge, this is the best noise performance reported at 30 GHz for gate-recessed AlGaN/GaN HEMTs. |
URI: | http://dx.doi.org/10.1109/LED.2009.2037167 http://hdl.handle.net/11536/5894 |
ISSN: | 0741-3106 |
DOI: | 10.1109/LED.2009.2037167 |
期刊: | IEEE ELECTRON DEVICE LETTERS |
Volume: | 31 |
Issue: | 2 |
起始頁: | 105 |
結束頁: | 107 |
Appears in Collections: | Articles |
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