標題: | Investigation of Switching-Time Variations for Nanoscale MOSFETs Using the Effective-Drive-Current Approach |
作者: | Wu, Yu-Sheng Fan, Ming-Long Su, Pin 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics |
關鍵字: | Line edge roughness (LER);MOSFET;random dopant fluctuation (RDF);switching time (ST) |
公開日期: | 1-二月-2010 |
摘要: | This letter investigates the impacts of random dopant fluctuation (RDF) and line edge roughness (LER) on the switching-time (ST) variation for nanoscale MOSFETs using the effective-drive-current (I(eff)) approach that decouples the ST variation into transition-charge (Delta Q) and I(eff) variations. Although the RDF has been recognized as the main variation source to the threshold-voltage variation, this letter indicates that the relative importance of LER increases as the ST variation is considered. |
URI: | http://dx.doi.org/10.1109/LED.2009.2037247 http://hdl.handle.net/11536/5940 |
ISSN: | 0741-3106 |
DOI: | 10.1109/LED.2009.2037247 |
期刊: | IEEE ELECTRON DEVICE LETTERS |
Volume: | 31 |
Issue: | 2 |
起始頁: | 162 |
結束頁: | 164 |
顯示於類別: | 期刊論文 |