微波電漿化學氣相沉積法研製氧化鈦薄膜

完整後設資料紀錄

DC 欄位	值	語言
dc.contributor.author	江炳耀	en_US
dc.contributor.author	Jiang, Bing Yao	en_US
dc.contributor.author	林鵬	en_US
dc.contributor.author	Lin, Peng	en_US
dc.date.accessioned	2014-12-12T02:14:12Z	-
dc.date.available	2014-12-12T02:14:12Z	-
dc.date.issued	1994	en_US
dc.identifier.uri	http://140.113.39.130/cdrfb3/record/nctu/#NT832159014	en_US
dc.identifier.uri	http://hdl.handle.net/11536/59678	-
dc.language.iso	en_US	en_US
dc.title	微波電漿化學氣相沉積法研製氧化鈦薄膜	zh_TW
dc.title	Fabrication of TiO2 thin films by microwave plasma chemical vapor deposition	en_US
dc.type	Thesis	en_US
dc.contributor.department	材料科學與工程學系	zh_TW
顯示於類別：	畢業論文