標題: | Investigation of Void Nucleation and Propagation in the Joule Heating Effect During Electromigration in Flip-Chip Solder Joints |
作者: | Chang, Y. W. Chiu, S. H. Chen, Chih 材料科學與工程學系 Department of Materials Science and Engineering |
關鍵字: | Electromigration;flip-chip solder joints |
公開日期: | 1-十一月-2010 |
摘要: | This study analyzes the effect of void propagation on the temperature increase of solder joints by using x-ray microscopy, Kelvin probes, and infrared microscopy. It was found that the temperature rise due to void formation was less than 1.3 degrees C when the voids depleted about 75% of the contact opening, even though bump resistance had increased to 10.40 times its initial value. However, the temperature rose abruptly with an increase of up to 8.0 degrees C when the voids depleted 96.2% of the contact opening. A hot spot was observed immediately before the occurrence of open failure in the solder bump. The local increase in temperature was about 30.2 degrees C at the spot. This spot may be the remaining contact area immediately before the occurrence of open failure. |
URI: | http://dx.doi.org/10.1007/s11664-010-1361-7 http://hdl.handle.net/11536/6012 |
ISSN: | 0361-5235 |
DOI: | 10.1007/s11664-010-1361-7 |
期刊: | JOURNAL OF ELECTRONIC MATERIALS |
Volume: | 39 |
Issue: | 11 |
起始頁: | 2489 |
結束頁: | 2494 |
顯示於類別: | 會議論文 |